CVD & PECVD
Plasma-enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases. The plasma is generally created by RF (AC) frequency or DC discharge between two electrodes, the space between which is filled with the reacting gases.
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1200°C PE/CVD Furnace W/ RF Generator, Gas Mix & Pumping System
$5,990.00 -
Digital Multi-Channel Gas Mixing System w/ Touch Screen Control
$6,490.00 -
1400°C CVD Tube Furnace with Gas Mixing & Pumping System
$7,990.00 -
1700°C CVD Tube Furnace with Gas Mixing & Pumping System
$8,990.00 -
Ai 500 Watts 13MHz RF Generator for Up To 150mm Tube Furnaces
$13,990.00