CVD & PECVD

Plasma-enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases. The plasma is generally created by RF (AC) frequency or DC discharge between two electrodes, the space between which is filled with the reacting gases.

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  • 1400°C CVD Tube Furnace with Gas Mixing & Pumping System

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    $5,990.00
  • Digital Multi-Channel Gas Mixing System w/ Touch Screen Control

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    $6,490.00
  • 1700°C CVD Tube Furnace with Gas Mixing & Pumping System

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    $7,690.00
  • 1200°C PE/CVD Furnace w/ RF Generator, Gas Mix & Pumping System

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    $8,990.00
  • Ai 500 Watts 13MHz RF Generator for Up To 150mm Tube Furnaces

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    $13,990.00